2 MeV Si ion implantation damage in relaxed Si

C O'Raifeartaigh, RC Barklie, A Nylandsted Larsen, F Priolo, G Franzo, G Lulli, M Bianconi, JKN Lindner, F Cristiano, PLF Hemment

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)165
Number of pages1
JournalNew Trends in Ion Beam Processing of Materials and Beam Induced Nanometric Phenomena
Publication statusPublished - 1997

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