@article{f6c4e29a908a47a3a8ed6ebb6925f148,
title = "Extreme ultraviolet source at 6.7 nm based on a low-density plasma",
abstract = "We demonstrate an efficient extreme ultraviolet (EUV) source for operation at = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.",
author = "Takeshi Higashiguchi and Takamitsu Otsuka and Noboru Yugami and Weihua Jiang and Akira Endo and Bowen Li and Deirdre Kilbane and Padraig Dunne and Gerry O'Sullivan",
note = "Funding Information: Part of this work was performed under the auspices of MEXT (Ministry of Education, Culture, Science and Technology, Japan) and “Utsunomiya University Distinguished Research Projects.” One of the authors (T.H.) also acknowledges support from The Canon Foundation. The UCD group acknowledges support from Science Foundation Ireland under Principal Investigator Research Grant No. 07/IN.1/1771.",
year = "2011",
month = nov,
day = "7",
doi = "10.1063/1.3660275",
language = "English",
volume = "99",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
number = "19",
}