Extreme ultraviolet source at 6.7 nm based on a low-density plasma

Takeshi Higashiguchi, Takamitsu Otsuka, Noboru Yugami, Weihua Jiang, Akira Endo, Bowen Li, Deirdre Kilbane, Padraig Dunne, Gerry O'Sullivan

Research output: Contribution to journalArticlepeer-review

50 Citations (Scopus)


We demonstrate an efficient extreme ultraviolet (EUV) source for operation at = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.

Original languageEnglish
Article number191502
JournalApplied Physics Letters
Issue number19
Publication statusPublished - 07 Nov 2011
Externally publishedYes


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