Laser-produced plasma UTA emission in 3-7 nm spectral region

Takeshi Higashiguchi; Takamitsu Otsuka; Noboru Yugami; Weihua Jiang; Akira Endo; Bowen Li; Colm O'Gorman; Thomas Cummins; Deirdre Kilbane; Padraig Dunne; Gerry O'Sullivan

doi:10.1117/12.916308

Laser-produced plasma UTA emission in 3-7 nm spectral region

Takeshi Higashiguchi, Takamitsu Otsuka, Noboru Yugami, Weihua Jiang, Akira Endo, Bowen Li, Colm O'Gorman, Thomas Cummins, Deirdre Kilbane, Padraig Dunne, Gerry O'Sullivan

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We demonstrate a table-top strong band emission water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays in the 2 to 4 nm region, extending below the carbon K edge (4.37 nm). Arrays resulting from n = 4-n = 4 transitions are overlaid with n = 4-n = 5 emission and shift to shorter wavelength with increasing atomic number. Under spectral analysis a guideline for microscope construction design for single-shot live cell imaging is proposed based on the use of a bismuth plasma source, coupled with multilayer mirror optics.

Original language	English
Title of host publication	Extreme Ultraviolet (EUV) Lithography III
DOIs	https://doi.org/10.1117/12.916308
Publication status	Published - 2012
Externally published	Yes
Event	Extreme Ultraviolet (EUV) Lithography III - San Jose, CA, United States Duration: 13 Feb 2012 → 16 Feb 2012

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8322
ISSN (Print)	0277-786X

Conference

Conference	Extreme Ultraviolet (EUV) Lithography III
Country/Territory	United States
City	San Jose, CA
Period	13/02/2012 → 16/02/2012

Keywords

Extreme ultraviolet (EUV)
High-Z
Laser-produced plasma (LPP)
Soft x-ray
Unresolved transition array (UTA)
Water window

Access to Document

10.1117/12.916308

Cite this

Higashiguchi, T., Otsuka, T., Yugami, N., Jiang, W., Endo, A., Li, B., O'Gorman, C., Cummins, T., Kilbane, D., Dunne, P., & O'Sullivan, G. (2012). Laser-produced plasma UTA emission in 3-7 nm spectral region. In Extreme Ultraviolet (EUV) Lithography III [83222J] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8322). https://doi.org/10.1117/12.916308

Higashiguchi, Takeshi ; Otsuka, Takamitsu ; Yugami, Noboru ; Jiang, Weihua ; Endo, Akira ; Li, Bowen ; O'Gorman, Colm ; Cummins, Thomas ; Kilbane, Deirdre ; Dunne, Padraig ; O'Sullivan, Gerry. / Laser-produced plasma UTA emission in 3-7 nm spectral region. Extreme Ultraviolet (EUV) Lithography III. 2012. (Proceedings of SPIE - The International Society for Optical Engineering).

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title = "Laser-produced plasma UTA emission in 3-7 nm spectral region",

abstract = "We demonstrate a table-top strong band emission water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays in the 2 to 4 nm region, extending below the carbon K edge (4.37 nm). Arrays resulting from n = 4-n = 4 transitions are overlaid with n = 4-n = 5 emission and shift to shorter wavelength with increasing atomic number. Under spectral analysis a guideline for microscope construction design for single-shot live cell imaging is proposed based on the use of a bismuth plasma source, coupled with multilayer mirror optics.",

keywords = "Extreme ultraviolet (EUV), High-Z, Laser-produced plasma (LPP), Soft x-ray, Unresolved transition array (UTA), Water window",

author = "Takeshi Higashiguchi and Takamitsu Otsuka and Noboru Yugami and Weihua Jiang and Akira Endo and Bowen Li and Colm O'Gorman and Thomas Cummins and Deirdre Kilbane and Padraig Dunne and Gerry O'Sullivan",

year = "2012",

doi = "10.1117/12.916308",

language = "English",

isbn = "9780819489784",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Extreme Ultraviolet (EUV) Lithography III",

note = "null ; Conference date: 13-02-2012 Through 16-02-2012",

}

Higashiguchi, T, Otsuka, T, Yugami, N, Jiang, W, Endo, A, Li, B, O'Gorman, C, Cummins, T, Kilbane, D, Dunne, P & O'Sullivan, G 2012, Laser-produced plasma UTA emission in 3-7 nm spectral region. in Extreme Ultraviolet (EUV) Lithography III., 83222J, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8322, Extreme Ultraviolet (EUV) Lithography III, San Jose, CA, United States, 13/02/2012. https://doi.org/10.1117/12.916308

Laser-produced plasma UTA emission in 3-7 nm spectral region. / Higashiguchi, Takeshi; Otsuka, Takamitsu; Yugami, Noboru; Jiang, Weihua; Endo, Akira; Li, Bowen; O'Gorman, Colm; Cummins, Thomas; Kilbane, Deirdre; Dunne, Padraig; O'Sullivan, Gerry.

Extreme Ultraviolet (EUV) Lithography III. 2012. 83222J (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8322).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Laser-produced plasma UTA emission in 3-7 nm spectral region

AU - Higashiguchi, Takeshi

AU - Otsuka, Takamitsu

AU - Yugami, Noboru

AU - Jiang, Weihua

AU - Endo, Akira

AU - Li, Bowen

AU - O'Gorman, Colm

AU - Cummins, Thomas

AU - Kilbane, Deirdre

AU - Dunne, Padraig

AU - O'Sullivan, Gerry

PY - 2012

Y1 - 2012

N2 - We demonstrate a table-top strong band emission water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays in the 2 to 4 nm region, extending below the carbon K edge (4.37 nm). Arrays resulting from n = 4-n = 4 transitions are overlaid with n = 4-n = 5 emission and shift to shorter wavelength with increasing atomic number. Under spectral analysis a guideline for microscope construction design for single-shot live cell imaging is proposed based on the use of a bismuth plasma source, coupled with multilayer mirror optics.

AB - We demonstrate a table-top strong band emission water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays in the 2 to 4 nm region, extending below the carbon K edge (4.37 nm). Arrays resulting from n = 4-n = 4 transitions are overlaid with n = 4-n = 5 emission and shift to shorter wavelength with increasing atomic number. Under spectral analysis a guideline for microscope construction design for single-shot live cell imaging is proposed based on the use of a bismuth plasma source, coupled with multilayer mirror optics.

KW - Extreme ultraviolet (EUV)

KW - High-Z

KW - Laser-produced plasma (LPP)

KW - Soft x-ray

KW - Unresolved transition array (UTA)

KW - Water window

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U2 - 10.1117/12.916308

DO - 10.1117/12.916308

M3 - Conference contribution

AN - SCOPUS:84861486824

SN - 9780819489784

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Extreme Ultraviolet (EUV) Lithography III

Y2 - 13 February 2012 through 16 February 2012

ER -

Laser-produced plasma UTA emission in 3-7 nm spectral region

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