Laser-produced plasma UTA emission in 3-7 nm spectral region

Takeshi Higashiguchi, Takamitsu Otsuka, Noboru Yugami, Weihua Jiang, Akira Endo, Bowen Li, Colm O'Gorman, Thomas Cummins, Deirdre Kilbane, Padraig Dunne, Gerry O'Sullivan

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


We demonstrate a table-top strong band emission water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays in the 2 to 4 nm region, extending below the carbon K edge (4.37 nm). Arrays resulting from n = 4-n = 4 transitions are overlaid with n = 4-n = 5 emission and shift to shorter wavelength with increasing atomic number. Under spectral analysis a guideline for microscope construction design for single-shot live cell imaging is proposed based on the use of a bismuth plasma source, coupled with multilayer mirror optics.

Original languageEnglish
Title of host publicationExtreme Ultraviolet (EUV) Lithography III
Publication statusPublished - 2012
Externally publishedYes
EventExtreme Ultraviolet (EUV) Lithography III - San Jose, CA, United States
Duration: 13 Feb 201216 Feb 2012

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


ConferenceExtreme Ultraviolet (EUV) Lithography III
Country/TerritoryUnited States
CitySan Jose, CA


  • Extreme ultraviolet (EUV)
  • High-Z
  • Laser-produced plasma (LPP)
  • Soft x-ray
  • Unresolved transition array (UTA)
  • Water window


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