MeV ion implantation induced damage in relaxed Si<sub>1-x</sub>Ge<sub>x</sub>

A. Nylandsted Larsen, C. O'Raifeartaigh, R.C. Barklie, B. Holm, F. Priolo, G. Franzo, G. Lulli, M. Bianconi, R. Nipoti, J.K.N. Lindner, A. Mesli, J.J. Grob, F. Cristiano, P.L.F. Hemment

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)
Original languageUndefined/Unknown
JournalJournal of Applied Physics
DOIs
Publication statusPublished - 1997

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