Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm

G. O'sullivan; Li Bowen; Padraig Dunne; Takamitsu Otsuka; Takeshi Higashiguchi; Noboru Yugami; Toyohiko Yatagai; Weihua Jiang; Akira Endo; Emma Sokell; Thomas Cummins; Colm O'gorman; Deirdre Kilbane

doi:10.1088/1742-6596/388/15/152020

Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm

G. O'sullivan, Li Bowen, Padraig Dunne, Takamitsu Otsuka, Takeshi Higashiguchi, Noboru Yugami, Toyohiko Yatagai, Weihua Jiang, Akira Endo, Emma Sokell, Thomas Cummins, Colm O'gorman, Deirdre Kilbane

Research output: Contribution to journal › Conference article › peer-review

Abstract

Recent increases in reflectance at 6.x nm of La/B4C multilayer mirrors has led to the adoption of this wavelength for the development of future sources for lithography. The emission from laser produced plasmas of Gd and Tb emit strongly in this wavelength region. The transitions responsible and the optimum plasma conditions for optimum emission have been identified both theoretically and experimentally.

Original language	English
Article number	152020
Journal	Journal of Physics: Conference Series
Volume	388
Issue number	PART 15
DOIs	https://doi.org/10.1088/1742-6596/388/15/152020
Publication status	Published - 2012
Externally published	Yes
Event	27th International Conference on Photonic, Electronic and Atomic Collisions, ICPEAC 2011 - Belfast, United Kingdom Duration: 27 Jul 2011 → 02 Aug 2011

Access to Document

10.1088/1742-6596/388/15/152020

Cite this

O'sullivan, G., Bowen, L., Dunne, P., Otsuka, T., Higashiguchi, T., Yugami, N., Yatagai, T., Jiang, W., Endo, A., Sokell, E., Cummins, T., O'gorman, C., & Kilbane, D. (2012). Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm. Journal of Physics: Conference Series, 388(PART 15), [152020]. https://doi.org/10.1088/1742-6596/388/15/152020

O'sullivan, G. ; Bowen, Li ; Dunne, Padraig ; Otsuka, Takamitsu ; Higashiguchi, Takeshi ; Yugami, Noboru ; Yatagai, Toyohiko ; Jiang, Weihua ; Endo, Akira ; Sokell, Emma ; Cummins, Thomas ; O'gorman, Colm ; Kilbane, Deirdre. / Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm. In: Journal of Physics: Conference Series. 2012 ; Vol. 388, No. PART 15.

@article{1e77b586f2374cf9a2fee2b06c9bd5c5,

title = "Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm",

abstract = "Recent increases in reflectance at 6.x nm of La/B4C multilayer mirrors has led to the adoption of this wavelength for the development of future sources for lithography. The emission from laser produced plasmas of Gd and Tb emit strongly in this wavelength region. The transitions responsible and the optimum plasma conditions for optimum emission have been identified both theoretically and experimentally.",

author = "G. O'sullivan and Li Bowen and Padraig Dunne and Takamitsu Otsuka and Takeshi Higashiguchi and Noboru Yugami and Toyohiko Yatagai and Weihua Jiang and Akira Endo and Emma Sokell and Thomas Cummins and Colm O'gorman and Deirdre Kilbane",

year = "2012",

doi = "10.1088/1742-6596/388/15/152020",

language = "English",

volume = "388",

journal = "Journal of Physics: Conference Series",

issn = "1742-6588",

publisher = "IOP Publishing Ltd.",

number = "PART 15",

note = "null ; Conference date: 27-07-2011 Through 02-08-2011",

}

O'sullivan, G, Bowen, L, Dunne, P, Otsuka, T, Higashiguchi, T, Yugami, N, Yatagai, T, Jiang, W, Endo, A, Sokell, E, Cummins, T, O'gorman, C & Kilbane, D 2012, 'Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm', Journal of Physics: Conference Series, vol. 388, no. PART 15, 152020. https://doi.org/10.1088/1742-6596/388/15/152020

Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm. / O'sullivan, G.; Bowen, Li; Dunne, Padraig; Otsuka, Takamitsu; Higashiguchi, Takeshi; Yugami, Noboru; Yatagai, Toyohiko; Jiang, Weihua; Endo, Akira; Sokell, Emma; Cummins, Thomas; O'gorman, Colm; Kilbane, Deirdre.

In: Journal of Physics: Conference Series, Vol. 388, No. PART 15, 152020, 2012.

Research output: Contribution to journal › Conference article › peer-review

TY - JOUR

T1 - Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm

AU - O'sullivan, G.

AU - Bowen, Li

AU - Dunne, Padraig

AU - Otsuka, Takamitsu

AU - Higashiguchi, Takeshi

AU - Yugami, Noboru

AU - Yatagai, Toyohiko

AU - Jiang, Weihua

AU - Endo, Akira

AU - Sokell, Emma

AU - Cummins, Thomas

AU - O'gorman, Colm

AU - Kilbane, Deirdre

PY - 2012

Y1 - 2012

N2 - Recent increases in reflectance at 6.x nm of La/B4C multilayer mirrors has led to the adoption of this wavelength for the development of future sources for lithography. The emission from laser produced plasmas of Gd and Tb emit strongly in this wavelength region. The transitions responsible and the optimum plasma conditions for optimum emission have been identified both theoretically and experimentally.

AB - Recent increases in reflectance at 6.x nm of La/B4C multilayer mirrors has led to the adoption of this wavelength for the development of future sources for lithography. The emission from laser produced plasmas of Gd and Tb emit strongly in this wavelength region. The transitions responsible and the optimum plasma conditions for optimum emission have been identified both theoretically and experimentally.

UR - http://www.scopus.com/inward/record.url?scp=84870600142&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/388/15/152020

DO - 10.1088/1742-6596/388/15/152020

M3 - Conference article

AN - SCOPUS:84870600142

VL - 388

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - PART 15

M1 - 152020

Y2 - 27 July 2011 through 2 August 2011

ER -

Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm

Abstract

Access to Document

Other files and links

Fingerprint

Cite this