Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6.x nm

G. O'sullivan, Li Bowen, Padraig Dunne, Takamitsu Otsuka, Takeshi Higashiguchi, Noboru Yugami, Toyohiko Yatagai, Weihua Jiang, Akira Endo, Emma Sokell, Thomas Cummins, Colm O'gorman, Deirdre Kilbane

Research output: Contribution to journalConference articlepeer-review

Abstract

Recent increases in reflectance at 6.x nm of La/B4C multilayer mirrors has led to the adoption of this wavelength for the development of future sources for lithography. The emission from laser produced plasmas of Gd and Tb emit strongly in this wavelength region. The transitions responsible and the optimum plasma conditions for optimum emission have been identified both theoretically and experimentally.

Original languageEnglish
Article number152020
JournalJournal of Physics: Conference Series
Volume388
Issue numberPART 15
DOIs
Publication statusPublished - 2012
Externally publishedYes
Event27th International Conference on Photonic, Electronic and Atomic Collisions, ICPEAC 2011 - Belfast, United Kingdom
Duration: 27 Jul 201102 Aug 2011

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