Shorter wavelength EUV source around 6.X nm by rare-earth plasma

Takamitsu Otsuka, Deirdre Kilbane, Thomas Cummins, Colm O'Gorman, Padraig Dunne, Gerry O'Sullivan, Weihua Jiang, Akira Endo, Takeshi Higashiguchi, Noboru Yugami

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We have demonstrated a laser-produced plasma extreme ultraviolet source operating in the 6.5-6.7 nm region based on rare-earth targets of Gd and Tb coupled with a Mo/B4C multilayer mirror. Multiply charged ions produce strong resonance emission lines, which combine to yield an intense unresolved transition array. The spectra of these resonant lines around 6.7 nm suggest that the in-band emission increases with increased plasma volume by suppressing the plasma hydrodynamic expansion loss at an electron temperature of about 50 eV, resulting in maximized emission. We also have investigated the dependence of the spectral behavior and conversion efficiencies of rare-earth plasma extreme ultraviolet sources with peak emission at 6.7 nm on laser wavelength and the initial target density. The maximum conversion efficiency was 1.3% at a laser intensity of 1.6 × 1012 W/cm2 at an operating wavelength of 1064 nm, when self-absorption was reduced by use of a low initial density target.

Original languageEnglish
Title of host publicationAdvances in X-Ray/EUV Optics and Components VI
DOIs
Publication statusPublished - 2011
Externally publishedYes
EventAdvances in X-Ray/EUV Optics and Components VI - San Diego, CA, United States
Duration: 22 Aug 201124 Aug 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8139
ISSN (Print)0277-786X

Conference

ConferenceAdvances in X-Ray/EUV Optics and Components VI
Country/TerritoryUnited States
CitySan Diego, CA
Period22/08/201124/08/2011

Keywords

  • Extreme ultraviolet
  • Gd
  • Laser-produced plasmas
  • Rare-earth
  • Tb

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