TY - JOUR
T1 - Variable composition laser-produced Sn plasmas - A study of their time-independent ion distributions
AU - Cummings, A.
AU - O'Sullivan, G.
AU - Dunne, P.
AU - Sokell, E.
AU - Murphy, N.
AU - White, J.
AU - Fahy, K.
AU - Fitzpatrick, A.
AU - Gaynor, L.
AU - Hayden, P.
AU - Kedzierski, D.
AU - Kilbane, D.
AU - Lysaght, M.
AU - McKinney, L.
AU - Sheridan, P.
PY - 2004/9/7
Y1 - 2004/9/7
N2 - The time-independent ion distributions of variable composition laser-produced Sn plasmas are studied for a wide range of electron temperatures and atomic number densities, the purpose of which is to elucidate the effect that varying the number density of Sn within a mixed species plasma has upon the steady state populations of Sn and its ions. Particular emphasis will be placed on binary mixtures of Sn with Li, C, O or Sm and more specifically the charge states Sn8+ to Sn13+ within these mixed plasmas, where it will be assumed that the plasma is optically thin. It is found that using these composites has relatively little effect upon the Sn ion population distributions for plasma atomic number densities of less than approximately 1019.5 cm-3. However, for greater values of number densities the Sn ion populations can be shifted by as much as 10-15 eV for Li mixtures. These results are of particular relevance to current research being carried out on extreme ultraviolet lithographic technologies for the optimization of XUV sources in the 13.5 nm wavelength region, which include composite target investigations.
AB - The time-independent ion distributions of variable composition laser-produced Sn plasmas are studied for a wide range of electron temperatures and atomic number densities, the purpose of which is to elucidate the effect that varying the number density of Sn within a mixed species plasma has upon the steady state populations of Sn and its ions. Particular emphasis will be placed on binary mixtures of Sn with Li, C, O or Sm and more specifically the charge states Sn8+ to Sn13+ within these mixed plasmas, where it will be assumed that the plasma is optically thin. It is found that using these composites has relatively little effect upon the Sn ion population distributions for plasma atomic number densities of less than approximately 1019.5 cm-3. However, for greater values of number densities the Sn ion populations can be shifted by as much as 10-15 eV for Li mixtures. These results are of particular relevance to current research being carried out on extreme ultraviolet lithographic technologies for the optimization of XUV sources in the 13.5 nm wavelength region, which include composite target investigations.
UR - http://www.scopus.com/inward/record.url?scp=4544310414&partnerID=8YFLogxK
U2 - 10.1088/0022-3727/37/17/006
DO - 10.1088/0022-3727/37/17/006
M3 - Article
AN - SCOPUS:4544310414
VL - 37
SP - 2376
EP - 2384
JO - Journal of Physics D: Applied Physics
JF - Journal of Physics D: Applied Physics
SN - 0022-3727
IS - 17
ER -